27 results
Failure Analysis of Trace Elements and Surfaces Using Hitachi Dedicated STEM
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- Journal:
- Microscopy and Microanalysis / Volume 25 / Issue S2 / August 2019
- Published online by Cambridge University Press:
- 05 August 2019, pp. 724-725
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- August 2019
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Electron Tomography of Stacked Contact/Via Structures
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- Microscopy and Microanalysis / Volume 18 / Issue S2 / July 2012
- Published online by Cambridge University Press:
- 23 November 2012, pp. 1798-1799
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- July 2012
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Correlation of resistance and interfacial reaction of contacts to n-type InP
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- Journal of Materials Research / Volume 17 / Issue 11 / November 2002
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- 31 January 2011, pp. 2929-2934
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- November 2002
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Energy Dispersive Spectrometry Calibration For The HD -2000 STEM
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- Microscopy and Microanalysis / Volume 8 / Issue S02 / August 2002
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- 01 August 2002, pp. 1192-1193
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- August 2002
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Effect of current crowding on contact failure in heavily doped n+- and p+-silicon-on-insulator
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- Journal of Materials Research / Volume 15 / Issue 11 / November 2000
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- 31 January 2011, pp. 2387-2392
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- November 2000
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Calibration Method for Elemental Quantification
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- Microscopy and Microanalysis / Volume 6 / Issue S2 / August 2000
- Published online by Cambridge University Press:
- 02 July 2020, pp. 536-537
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- August 2000
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Comparison of Elemental Detection Using Microcalorimetry, SIMS, AES and EDS (SEM, STEM, and TEM)
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- Microscopy and Microanalysis / Volume 6 / Issue S2 / August 2000
- Published online by Cambridge University Press:
- 02 July 2020, pp. 128-129
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- August 2000
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Patterning of GaN in High-Density Cl2- and BCl3-Based Plasmas
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- Journal:
- MRS Online Proceedings Library Archive / Volume 468 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 355
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- 1997
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Cl2-Based Dry Etching Of The AIGaInN System In Inductively Coupled Plasmas
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- MRS Online Proceedings Library Archive / Volume 483 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 327
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- 1997
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ICP Dry Etching of III-V Nitrides
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- MRS Online Proceedings Library Archive / Volume 468 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 393
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- 1997
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Wet Chemical Etching Survey Of III-Nitrides
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- MRS Online Proceedings Library Archive / Volume 483 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 265
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- 1997
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Rapid Thermal Processing of III-Nitrides
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- MRS Online Proceedings Library Archive / Volume 470 / 1997
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- 10 February 2011, 401
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- 1997
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Current Transport in W and WSIX Ohmic Contacts to Ingan and Inn
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- MRS Online Proceedings Library Archive / Volume 468 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 413
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- 1997
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Chlorine-Based Plasma Etching of GaN
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- MRS Online Proceedings Library Archive / Volume 449 / 1996
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- 10 February 2011, 969
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- 1996
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Dry Etch Damage In InN, InGaN and InAIN
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- MRS Online Proceedings Library Archive / Volume 423 / 1996
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- 15 February 2011, 163
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- 1996
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Electron Cyclotron Resonance Etching of SiC in SF6/O2 and NF3 /O2 Plasmas
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- MRS Online Proceedings Library Archive / Volume 421 / 1996
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- 10 February 2011, 251
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- 1996
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Comparison of ICl and IBr for Dry Etching of III-Nitrides
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- MRS Online Proceedings Library Archive / Volume 449 / 1996
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- 10 February 2011, 1023
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- 1996
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Chemical Etching of AlN and InAlN in KOH Solutions
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- MRS Online Proceedings Library Archive / Volume 449 / 1996
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- 10 February 2011, 1017
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- 1996
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High Temperature Surface Degradation of III-V Nitrides
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- MRS Online Proceedings Library Archive / Volume 423 / 1996
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- 15 February 2011, 569
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- 1996
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Plasma Chemistries for Dry Etching GaN, AIN, InGaN and InAIN
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- MRS Online Proceedings Library Archive / Volume 421 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 309
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- 1996
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